The first energy spread measurement of electron beam produced by MPG
نویسندگان
چکیده
منابع مشابه
Measurement of the Aps Storage Ring Electron Beam Energy Spread Using Undulator Spectra
Abstract The angle-integrated flux spectrum of an undulator has sharp dropoffs at harmonic photon energies. Its derivative therefore shows pronounced peaks with rms width ∆ω/ω ~ 0.4/nN, where ω is the photon energy, n is the harmonic number, and N is the number of undulator periods. For the fundamental photon energy of the Advanced Photon Source diagnostics undulator, the derivative of the angl...
متن کاملBenchmarking of Monte Carlo model of 6 Mv photon beam produced by Siemens Oncor® linear accelerator: determination of initial electron beam parameters in comparison with measurement
Introduction: The aim of this study was to investigate the initial electron beam parameters for Monte Carlo model of 6MV photon beam produced by Siemens Oncor® linear accelerator. Materials and Methods: In this study, the EGSnrc Monte Carlo user codes BEAMnrc and DOSXYZnrc were used. The beamnrc code were used for modelling of a 6 MV photon beam produced by...
متن کاملElectron beam energy spread measurements using optical klystron radiation
B. Jia,* J. Li, S. Huang, Scott C. Schmidler, and Y.K. Wu Department of Physics, Duke University, Durham, North Carolina 27708, USA DFELL, Triangle Universities Nuclear Laboratory, Durham, North Carolina 27708, USA IHIP, School of Physics, Peking University, Beijing 100871, China Department of Statistical Science, Duke University, Durham, North Carolina 27708, USA (Received 28 May 2010; publish...
متن کاملElectron beam energy QA — a note on measurement tolerances
Monthly QA is recommended to verify the constancy of high-energy electron beams generated for clinical use by linear accelerators. The tolerances are defined as 2%/2 mm in beam penetration according to AAPM task group report 142. The practical implementation is typically achieved by measuring the ratio of readings at two different depths, preferably near the depth of maximum dose and at the dep...
متن کاملNanolithography by high energy electron beam
2014 The theoretical advantages of high energy beam (E0 = 100 keV) in electron lithography in the nanometer range ( 0.1 03BCm) are discussed. Using a Monte Carlo model, the different contributions at energy deposit in the PMMA resist are separated and the influence of each of them on the final resolution is analysed. Revue Phys. Appl. 23 (1988) JUILLET 1988, PAGE 1317 Classification Physics Abs...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: Results in Physics
سال: 2017
ISSN: 2211-3797
DOI: 10.1016/j.rinp.2017.10.030